DNP Achieves Fine Pattern Resolution on EUV Lithography Photomasks for Beyond 2nm Generation
DAI NIPPON PRINTING S/ADR (DNPLY)
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Source: Business Wire
Commences sample supply of high-NA EUV photomasks for next-generation semiconductors TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10-9 meter) generation1 that support Extreme Ultra-Violet (EUV) lithography, a cutting-edge process in semiconductor manufacturing.This press release features multimedia. View the full release here: https://www.businesswire.com/news/home/20241208160921/en/Image of photomask for beyond 2nm generation EUV lithography (Photo: Business Wire)DNP has also completed the criteria evaluation for photomasks compatible with High-Numerical Aperture2, the application being considered for next-generation semiconductors beyond the 2nm generation, and has commenced the supply of evaluation photomasks. High-NA EUV lithography makes it possible to form fine patterns on silicon wafers with a higher resolution than previou
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